Structural studies of evaporated CoxCr1-x/Si (1 0 0) and CoxCr1-x/glass thin films
Identifieur interne : 000783 ( Main/Exploration ); précédent : 000782; suivant : 000784Structural studies of evaporated CoxCr1-x/Si (1 0 0) and CoxCr1-x/glass thin films
Auteurs : A. Kharmouche [Algérie] ; I. Djouada [Algérie]Source :
- Applied surface science [ 0169-4332 ] ; 2008.
Descripteurs français
- Pascal (Inist)
- Composition surface, Verre, Couche mince, Evaporation sous vide, Modélisation, RBS, Epaisseur, Simulation, Diffusion mutuelle, Diffusion(transport), Diffraction RX, Réseau hexagonal compact, Orientation préférentielle, Microscopie force atomique, Cobalt alliage, Chrome alliage, Alliage binaire, Alliage CoCr, Silicium, 6855J, 8280Y, 6855N, 6110N.
- Wicri :
- topic : Verre, Simulation.
English descriptors
- KwdEn :
Abstract
Series of CoxCr1-x thin films have been evaporated under vacuum onto Si (1 0 0) and glass substrates. Chemical composition and interface properties have been studied by modelling Rutherford backscattering spectra (RBS) using SIMNRA programme. Thickness ranges from 17 to 220 nm, and x from 0.80 to 0.88. Simulation of the energy spectra shows an interdiffusion profile in the thickest films, but no diffusion is seen in thinner ones. Microscopic characterizations of the films are done with X-ray diffraction (XRD) measurements. All the samples are polycrystalline, with an hcp structure and show a <0001>preferred orientation. Atomic force microscopies (AFM) reveal very smooth film surfaces.
Affiliations:
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Le document en format XML
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Cr<sub>1-x</sub>
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Cr<sub>1-x</sub>
/glass thin films</title>
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Cr<sub>1-x</sub>
/Si (1 0 0) and Co<sub>x</sub>
Cr<sub>1-x</sub>
/glass thin films</title>
<author><name sortKey="Kharmouche, A" sort="Kharmouche, A" uniqKey="Kharmouche A" first="A." last="Kharmouche">A. Kharmouche</name>
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<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Atomic force microscopy</term>
<term>Binary alloys</term>
<term>Chromium alloys</term>
<term>Cobalt alloys</term>
<term>Diffusion</term>
<term>Glass</term>
<term>HCP lattices</term>
<term>Interdiffusion</term>
<term>Modelling</term>
<term>Preferred orientation</term>
<term>RBS</term>
<term>Silicon</term>
<term>Simulation</term>
<term>Surface composition</term>
<term>Thickness</term>
<term>Thin films</term>
<term>Vacuum evaporation</term>
<term>XRD</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Composition surface</term>
<term>Verre</term>
<term>Couche mince</term>
<term>Evaporation sous vide</term>
<term>Modélisation</term>
<term>RBS</term>
<term>Epaisseur</term>
<term>Simulation</term>
<term>Diffusion mutuelle</term>
<term>Diffusion(transport)</term>
<term>Diffraction RX</term>
<term>Réseau hexagonal compact</term>
<term>Orientation préférentielle</term>
<term>Microscopie force atomique</term>
<term>Cobalt alliage</term>
<term>Chrome alliage</term>
<term>Alliage binaire</term>
<term>Alliage CoCr</term>
<term>Silicium</term>
<term>6855J</term>
<term>8280Y</term>
<term>6855N</term>
<term>6110N</term>
</keywords>
<keywords scheme="Wicri" type="topic" xml:lang="fr"><term>Verre</term>
<term>Simulation</term>
</keywords>
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<front><div type="abstract" xml:lang="en">Series of Co<sub>x</sub>
Cr<sub>1-x</sub>
thin films have been evaporated under vacuum onto Si (1 0 0) and glass substrates. Chemical composition and interface properties have been studied by modelling Rutherford backscattering spectra (RBS) using SIMNRA programme. Thickness ranges from 17 to 220 nm, and x from 0.80 to 0.88. Simulation of the energy spectra shows an interdiffusion profile in the thickest films, but no diffusion is seen in thinner ones. Microscopic characterizations of the films are done with X-ray diffraction (XRD) measurements. All the samples are polycrystalline, with an hcp structure and show a <0001>preferred orientation. Atomic force microscopies (AFM) reveal very smooth film surfaces.</div>
</front>
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<affiliations><list><country><li>Algérie</li>
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<name sortKey="Djouada, I" sort="Djouada, I" uniqKey="Djouada I" first="I." last="Djouada">I. Djouada</name>
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